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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Sitemtc-m16c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP8W/34C6E7E
Repositóriosid.inpe.br/mtc-m18@80/2008/12.08.17.59
Repositório de Metadadossid.inpe.br/mtc-m18@80/2008/12.08.17.59.04
Última Atualização dos Metadados2018:06.04.04.05.52 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoMirandaBalRibBelFer:2008:NaGrSi
TítuloNanodiamond growth on silicon substrate through the etching of reticulated vitreous carbon produced at different temperatures
Ano2008
Data de Acesso18 maio 2024
Tipo SecundárioPRE CN
2. Contextualização
Autor1 Miranda, C. R. B.
2 Baldan, Maurí
3 Ribeiro, cio
4 Beloto, Antonio Fernando
5 Ferreira, Neidenei Gomes
Grupo1 LAS-CTE-INPE-MCT-BR
2 LAS-CTE-INPE-MCT-BR
3 LAS-CTE-INPE-MCT-BR
4 LAS-CTE-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
Nome do EventoEncontro SBPMat, 7.
Localização do EventoGuarujá, SP
Data28 set. - 02 out.
Título do LivroAnais
Tipo TerciárioPoster
Histórico (UTC)2008-12-08 17:59:04 :: simone -> administrator ::
2018-06-04 04:05:52 :: administrator -> marciana :: 2008
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Palavras-Chavenanodiamond
reticulated vitreous carbon
chemical vapor deposition
ResumoNanocrystalline diamond (NCD) films, formed on silicon substrate, through the etching of solid carbon, produced at different temperatures, was investigated. Reticulated vitreous carbon (RVC) produced at different heat treatment temperatures (HTT) of 1300, 1500 and 2000 ¨¬C was used to compare its influence on the NCD growth in a hot filament chemical vapor deposition reactor (CVD). In this chemical vapor deposition process a piece of RVC was used, just below the silicon substrate, as an additional solid source of hydrocarbon, that ensures the production of pertinent carbon growth species like CH3 directly on silicon. This hydrocarbon amount was associated to the RVC microstructure controlled by its graphitization index. This procedure showed to be determinant to grow diamond grains uniformly on the silicon substrate. The films were deposited at 700 ¨¬C substrate temperature using 200 sccm gas flows. The mixture of CH4 varying from 0 to 1.0 vol. % in Ar/H2 was also used keeping the Ar concentration in 90 vol.%. NCD Scanning Electron Microscopy images showed faceted nanograins with uniform surface texture covering all the substrate. Raman measurements showed the D and G bands, as well as the typical two shoulders at 1150 and 1490 cm-1 attributed to NCD. The crystalline structures of these films, analyzed by X-ray diffraction, showed a main diamond peak of (111) orientation with 2¥è = 43.9¡Æ and peaks of (220) and (311) diamond reflection at 2¥è = 75.5¡Æ and 91.4¡Æ respectively. From Sherrer¡¯s formula the average size was evaluated in the range of 5 up to 20 nm. From X-ray photoelectron spectroscopy we have quantified the surface composition of the RVC and the formed diamond film. The composition of the RVC showed to play an important role in the CVD synthesis of diamond.
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4. Condições de acesso e uso
Idiomaen
Grupo de Usuáriossimone
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Visibilidadeshown
Permissão de Leituraallow from all
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ESR3H2
Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17
6. Notas
Campos Vaziosarchivingpolicy archivist callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format isbn issn label lineage mark mirrorrepository nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark type url versiontype volume
7. Controle da descrição
e-Mail (login)marciana
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